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Particles on Surfaces 2 Detection, Adhesion, and Removal

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Beschreibung

Produktdetails

Einband

Gebundene Ausgabe

Erscheinungsdatum

31.01.1990

Abbildungen

336 p.

Herausgeber

K.L. Mittal

Verlag

Springer Us

Seitenzahl

336

Gewicht

780 g

Auflage

1989

Sprache

Englisch

ISBN

978-0-306-43367-2

Beschreibung

Produktdetails

Einband

Gebundene Ausgabe

Erscheinungsdatum

31.01.1990

Abbildungen

336 p.

Herausgeber

K.L. Mittal

Verlag

Springer Us

Seitenzahl

336

Gewicht

780 g

Auflage

1989

Sprache

Englisch

ISBN

978-0-306-43367-2

Herstelleradresse

Libri GmbH
Europaallee 1
36244 Bad Hersfeld
DE

Email: gpsr@libri.de

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  • Produktbild: Particles on Surfaces 2
  • Produktbild: Particles on Surfaces 2
  • I. Particle-Substrate Interaction, Deposition and Adhesion.- The Adhesion of Small Particles to a Surface.- Application of Impact Adhesion Theory to Particle Kinetic Energy Loss Measurements.- Adhesion Force Due to a Meniscus in a Crossed-Fiber System.- Adhesion Induced Deformations Between Particles and Substrates.- The Effect of External Noises on the Attachment of Particles to Solid Surfaces.- Measurement of Detachable Submicrometer Particles and Surface Cleanliness of Clean Room Garments.- Accumulation of Particle Derived Ionic Contaminants on Electronic Equipment: Airbone Concentrations and Deposition Velocities.- Adhesion of Ash Particles on Heat Transfer Surfaces in Coal Combustion Applications: Mechanisms and Implications.- Factors Affecting Adhesion of Drug Particles to Surfaces in Pharmaceutical Systems.- II. Particle Detection, Analysis and Characterization.- The Role of Infrared and Raman Microspectroscopies in the Characterization of Particles on Surfaces.- Infrared and Raman Microspectroscopy: An Overview of Their Use in the Identification of Microscopic Particulates.- Particle Identification by Auger Electron Spectroscopy.- Identification and Characterization of Normetallic Particulate Contamination Removed from Aerospace Components.- Surface Particle Inspection Plans in Semiconductor Manufacturing.- Particulate Generation and Detection on Surfaces.- Identification of Small Particles on a Silicon Wafer.- The Evaluation of PWA and SMA Cleanliness Levels for “In-Line” Defluxing by High Performance Liquid Chromatography.- III. Particle Prevention and Implications.- Wear Resistant Coatings Reduce Particulate Contamination in a Magnetic Disk Drive.- Particle Reduction on Silicon Wafers as a Result of Isopropyl Alcohol Vapor Displacement Drying after Wet Processing.- Implications of Particle Contamination for Thin Film Growth.- Implications of Particulate Contamination in E-Beam Lithography.- IV. Particle Removal.- Enhanced Removal of Sub-Micron Particles from Surfaces by High Molecular Weight Fluorocarbon Surfactant Solutions.- Comparison of Freon with Water Cleaning Processes for Disk-Drive Parts.- Ultrasonic and Hydrodynamic Techniques for Particle Removal from Silicon Wafers.- New Sonic Cleaning Technology for Particle Removal from Semiconductor Surfaces.- About the Contributors.